Glass

Substrates

Train a pipeline specific to your defects.

Identify leaks between micro-channels and valve degradation that causes leaks.

The nSpec LS can efficiently increase yields in the lab and scale processes.

ModularField upgradeable to automated system

Max wafer size300 mm

Scan resolution0.9 µm/pixel (w/ 5x objective)

Pattern defect
Train a custom pipeline to fine tune process to ensure a replicated pattern across devices.
Plating defects
Determine irregularities that occur during the plating process.
General defects
Classify general defects such as particles, contamination, and surface defects.