Gallium Antimonide
IR detectors
IR detectors
Features
Identifying critical defects in gallium antimonide
Our AI provides solutions
Train a pipeline specific to your defects.
Identify micropits and slip lines
Analyzers tuned for precise classification of different defects.
Recommended Product
nSpecPRISM
The nSpec PRISM offers a complete solution for compound semiconductor front-end wafer production, from unpolished substrates to epitaxy and device manufacturing.
System highlights
Illumination modesUV & IR illumination
Max wafer size200 mm
Scan resolution0.9 µm/pixel (w/ 5x objective)
Benefits
Defect types
Dislocations
Detect defect types by shape and provide count, sizes, and locations for all defects such as edge dislocations and screw dislocations.
Lattice mismatch
Easily identify lattice mismatch and thermal stress from a difference in thermal expansion coefficients.
Surface defects
Surface imperfections can affect the quality of subsequent layers deposited on the wafer.
Industries
Our solutions are tailored to meet the unique challenges and demands of each sector.
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