Case Studies

Epi and Substrate Defect Inspection

Defect Map Mosaic of 100mm SiC Epi WaferDefect Map Mosaic of 100mm SiC Epi Wafer
Distant shot of defects on a 100mm SiC Epi WaferDistant shot of defects on a 100mm SiC Epi Wafer
Defects found on a 100mm SiC Epi Wafer

Distinguishing between substrate and epitaxial defects is essential to vertically integrated customers and chief suppliers. The differentiation prevents time-consuming investigations of anomalies.

Classification allows customers to identify at which point a defect was introduced—and take definitive action with devices like the nSpec Macro.

Two defects on a 100mm SiC Epi WaferTwo defects on a 100mm SiC Epi Wafer
Two defects on a 100mm Sic Epi Wafer Tile
Close up of defect on a 100mm SiC Epi WaferClose up of defect on a 100mm SiC Epi Wafer
Close up of defect on a 100mm SiC Epi Wafer

nSpec enables users to create new classifications as the need arises during manufacturing. This gives customers complete flexibility as they develop new materials or change processes.

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